CHEMICAL-MECHANICAL PLANARIZATION COMPOSITION HAVING LOW CORROSIVE PROPERTY, AND CHEMICAL-MECHANICAL PLANARIZATION METHOD

摘要

PURPOSE: A chemical-mechanical planarization composition and chemical-mechanical planarization method are provided to secure the excellent corrosion protection function.;CONSTITUTION: A chemical-mechanical planarization composition contains the following: a compound selected from the group consisting of cyanurate, isocyanurate, oxalic acid, and their sa an abrasive; and an oxidizer. A chemical-mechanical planarization method of a surface containing a barrier layer material comprises the following steps: contacting a substrate with the surface containing the barrier layer material with a polishing pad; applying the chemical-mechanical planarization composition; and polishing the substrate with the composition.;COPYRIGHT KIPO 2012