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首页> 外文期刊>電子情報通信学会技術研究報告. シリコン材料·デバイス. Silicon Devices and Materials >Effects of dot size and its distribution on electron number control and distribution of potential in MOSFET memories based on silicon nanocrystal floating dots
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Effects of dot size and its distribution on electron number control and distribution of potential in MOSFET memories based on silicon nanocrystal floating dots

机译:点大小及其分布对基于硅纳米晶体浮点的MOSFET存储器中电子数控制和电势分布的影响

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摘要

Effects of dot size and dot size distribution on electron number control in silicon floating dot memories at room temperature are investigated by numerical calculation. As the dot size increases and the size distribution increases, the staircase feature disappears due to the averaging effects. It is found that, to obtain a distinct staircase feature, the size distribution should be less than 7% for the 8-nm-diameter dot size and 12% for the 3-nm-diameter dot. These results provide good guidelines for setting device parameters for fabricating silicon floating dot memories.
机译:通过数值计算研究了点大小和点大小分布对硅浮点存储器在室温下电子数控制的影响。随着点大小的增加和大小分布的增加,由于平均效应,阶梯特征消失了。已经发现,为了获得独特的阶梯状特征,对于直径为8 nm的点尺寸,尺寸分布应小于7%,对于直径为3 nm的点尺寸分布应小于12%。这些结果为设置用于制造硅浮点存储器的设备参数提供了良好的指导。

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