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Nb doped SnO{sub}2 transparent conductive oxide films for analog type touch panels

机译:Nb掺杂的SnO {sub} 2透明导电氧化物膜,用于模拟型触摸屏

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摘要

We have studied Nb doped SnO{sub}2 transparent conductive film for analog type touch panel. An analog type touch panel does not necessitate the etching of transparent electrode. Therefore, chemically stable SnO{sub}2 film can be applied for its electrode. Nb doped SnO{sub}2 film were made under conditions of deposition temperature at 200℃ or 300℃, anneal temperature of 300℃ or 400℃ by r.f. magnetron sputtering. Resisitivities ranging between 7×10{sup}(-3)~3×10{sup}(-2) Ωcm and transmittance of more than 90% at 550nm were obtained. Further it was found that the mechanical properties such as abrasion resistance, adhesion strength and hardness are superior to those of ITO film.
机译:我们已经研究了用于模拟型触摸屏的掺Nb的SnO {sub} 2透明导电膜。模拟型触摸面板不需要蚀刻透明电极。因此,可以将化学稳定的SnO {sub} 2薄膜应用于其电极。用r.f法在200℃或300℃的沉积温度,300℃或400℃的退火温度的条件下制得掺Nb的SnO {sub} 2薄膜。磁控溅射。电阻率在7×10 {sup}(-3)〜3×10 {sup}(-2)Ωcm之间,在550nm处的透射率大于90%。进一步发现,机械性能例如耐磨性,粘合强度和硬度优于ITO膜。

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