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Growth of nitride semiconductors on SiC substrates by RF-MBE

机译:RF-MBE在SiC衬底上生长氮化物半导体

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摘要

We have successfully grown GaGdN and AlGdN alloy semiconductors by RF-MBE for the first time. Those are epitaxially grown on (0001) 6H-SiC substrates. The strained lattice constants for the a-axis and the c-axis of wurtzite structure of GdN are estimated to be 0.348nm and 0.549nm, respectively. The band-edge emission wavelength of Ga{sub}0.94Gd{sub}0.06N measured by room temperature cathodolumihescence (CL) is 370nm, which is slightly longer than that of GaN (363nm). A Gd{sup}(3+) related emission is also observed at 645nm in the CL spectra. In the CL spectra of AlGdN, a strong and sharp emission located at 317nm is observed.
机译:我们首次通过RF-MBE成功地生长了GaGdN和AlGdN合金半导体。它们在(0001)6H-SiC衬底上外延生长。估计GdN的纤锌矿结构的a轴和c轴的应变晶格常数分别为0.348nm和0.549nm。通过室温阴极发光(CL)测得的Ga {sub} 0.94Gd {sub} 0.06N的带边发射波长为370nm,比GaN(363nm)稍长。在CL光谱中也观察到了与Gd {sup}(3+)相关的​​发射。在AlGdN的CL光谱中,观察到317nm处有强烈而尖锐的发射。

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