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首页> 外文期刊>Journal of the European Ceramic Society >Dielectric investigations of PLT(28) thin film prepared by reactive magnetron sputter
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Dielectric investigations of PLT(28) thin film prepared by reactive magnetron sputter

机译:反应磁控溅射制备PLT(28)薄膜的介电研究

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摘要

Paraelectric PLT(lead lanthanium titanate) thin films were prepared by dc magnetron sputtering with multi element metal target. In order to crystallize the as-deposited PLT thin films to the cubic perovskite phase, post-heat treatment was applied at the temperatures from 450 to 750 deg C. The composition of PLT(28) thin film was: Pb, 0.72; La, 0.28; Ti, 0.88; O, 2.9. The dielectric characteristics were essentially dependent on the changes in the chemical composition and crystalline phase with variation of annealing treatment. The dielectric constant increased and dissipation factor decreased slightly, as the post-annealing temperature increased. The dielectric constant and dissipation factor at low electric field measurement of the capacitors with highest dielectric properties were 1216 and 0.018, respectively.
机译:通过直流磁控溅射多元素金属靶制备顺电PLT(钛酸铅镧)薄膜。为了使沉积的PLT薄膜结晶为立方钙钛矿相,在450至750℃的温度下进行了后热处理。PLT(28)薄膜的组成为:Pb,0.72; Pb,0.72; Pb,0.72。 La 0.28;钛,0.88; O,2.9。介电特性基本上取决于化学成分和晶相随退火处理的变化而变化。随着后退火温度的升高,介电常数增加而耗散因数略有降低。具有最高介电特性的电容器在低电场下的介电常数和耗散系数分别为1216和0.018。

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