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首页> 外文期刊>Journal of Semiconductors >Two-dimensional numerical computation of the structure-dependent spectral response in a 4H-SiC metal–semiconductor–metal ultraviolet photodetector with consideration of reflection and absorption on contact electrodes
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Two-dimensional numerical computation of the structure-dependent spectral response in a 4H-SiC metal–semiconductor–metal ultraviolet photodetector with consideration of reflection and absorption on contact electrodes

机译:考虑接触电极反射和吸收的4H-SiC金属-半导体-金属紫外光电探测器中与结构有关的光谱响应的二维数值计算

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摘要

A two-dimensional model of a 4H-SiC metal–semiconductor–metal (MSM) ultraviolet photodetector has been established using a self-consistent numerical calculation method. The structure-dependent spectral re-sponse of a 4H-SiC MSM detector is calculated by solving Poisson's equation, the current continuity equation and the current density equation. The calculated results are verified with experimental data. With consideration of the reflection and absorption on the metal contacts, a detailed study involving various electrode heights (H), spac-ings (S) and widths (W) reveals conclusive results in device design. The mechanisms responsible for variations of responsivity with those parameters are analyzed. The findings show that responsivity is inversely proportional to electrode height and is enhanced with an increase of electrode spacing and width. In addition, the ultraviolet (UV)-to-visible rejection ratio is > 103. By optimizing the device structure at 10 V bias, a responsivity as high as 180.056 mA/W, a comparable quantum efficiency of 77.93% and a maximum UV-to-visible rejection ratio of 1875 are achieved with a detector size of H 50 nm, S = 9μm and W = 3 μm.
机译:使用自洽数值计算方法建立了4H-SiC金属-半导体-金属(MSM)紫外线光电探测器的二维模型。通过求解泊松方程,电流连续性方程和电流密度方程,计算出4H-SiC MSM检测器的结构相关光谱响应。计算结果已通过实验数据验证。考虑到金属触点上的反射和吸收,涉及各种电极高度(H),间距(S)和宽度(W)的详细研究显示了器件设计的最终结果。分析了响应度随这些参数变化的机制。研究结果表明,响应度与电极高度成反比,并且随着电极间距和宽度的增加而增强。此外,紫外线(UV)到可见光的排斥比>103。通过在10 V偏压下优化器件结构,可得到高达180.056 mA / W的响应度,可比的量子效率77.93%和最大的UV-当检测器尺寸为H 50 nm,S =9μm和W = 3μm时,可见光抑制比达到1875。

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