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首页> 外文期刊>Journal of Superconductivity and Novel Magnetism >Enhancement in High-Field J_c Properties and the Flux Pinning Mechanism of MgB_2 Thin Films on Crystalline SiC Buffer Layers
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Enhancement in High-Field J_c Properties and the Flux Pinning Mechanism of MgB_2 Thin Films on Crystalline SiC Buffer Layers

机译:晶体SiC缓冲层上MgB_2薄膜的高场J_c特性增强和助焊剂钉扎机制

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摘要

We have studied the influence of crystalline SiC buffer layers on the critical current density and on the flux pinning mechanism in MgB_2 thin films. Crystalline SiC buffer layers were deposited on the Al_2O_3 (0001) substrates by using a pulsed laser deposition method, and then MgB_2 thin films were grown on the SiC-buffered layer by using a hybrid physical-chemical vapor deposition technique. MgB_2 thin films with crystalline SiC-buffered layers showed a significant critical current density's enhancement in the high magnetic field region. An uncommon plateau-like behavior was also observed when the normalized flux pinning force density was scaled with the reduced magnetic field. Based on the analyses of the scaling behavior of the flux pinning force, grain boundary pinning is likely to be a dominant pinning mechanism in the SiC-buffered MgB_2 thin films.
机译:我们研究了晶体SiC缓冲层对MgB_2薄膜中的临界电流密度和磁通钉扎机制的影响。通过使用脉冲激光沉积方法在Al_2O_3(0001)衬底上沉积结晶SiC缓冲层,然后使用混合物理化学气相沉积技术在SiC缓冲层上生长MgB_2薄膜。具有结晶SiC缓冲层的MgB_2薄膜在高磁场区域显示出明显的临界电流密度增强。当归一化的磁通钉扎力密度与减小的磁场成比例时,也观察到了罕见的高原样行为。基于对通量钉扎力的缩放行为的分析,晶界钉扎很可能是SiC缓冲MgB_2薄膜中的主要钉扎机制。

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