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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Electrical and electroluminescence properties of As-doped p-type ZnO nanorod arrays
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Electrical and electroluminescence properties of As-doped p-type ZnO nanorod arrays

机译:掺杂As的p型ZnO纳米棒阵列的电和电致发光特性

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We have reported the growth of p-type As-doped ZnO nanorod (NR) arrays and their electrical and electroluminescence (EL) properties. Well-directed ZnO NR arrays were grown on the Si substrate. The GaAs wafer was employed as an arsenic resource. Thermal anneal was performed to diffuse an As element into a ZnO NR. The As content increased with the increase in annealing time and temperature, which was measured utilizing energy dispersive x-ray spectroscopy in transmission electron microscopy (TEM). When enough As was doped, ZnO NR arrays began to show p-type behaviour and formed good p - n heterojunctions with the n-type Si substrate. The high-resolution TEM (HRTEM) was employed to measure the lattice structure change in the ZnO NR before and after As doping. The ultraviolet EL spectrum of the n-Si/p-ZnO NR arrays' light emitting diode device was measured at room temperature and a peak at a wavelength of about 380 nm was observed in the spectrum.
机译:我们已经报告了p型掺杂As的ZnO纳米棒(NR)阵列的生长及其电和电致发光(EL)特性。定向良好的ZnO NR阵列在Si衬底上生长。 GaAs晶片被用作砷资源。进行热退火以将As元素扩散到ZnO NR中。随着退火时间和温度的增加,As含量增加,这是利用透射电子显微镜(TEM)中的能量色散X射线光谱法测定的。当掺杂足够的As时,ZnO NR阵列开始表现出p型行为,并与n型Si衬底形成良好的p-n异质结。高分辨率TEM(HRTEM)用来测量As掺杂前后ZnO NR中的晶格结构变化。在室温下测量n-Si / p-ZnO NR阵列的发光二极管器件的紫外EL光谱,并在该光谱中观察到约380 nm波长的峰。

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