Deposition of SiO2 Thin Films by Atmospheric Pressure Glow Plasma on Polycarbonate

摘要

SiO2 films were deposited using both atmospheric glow plasma chemical deposition(APG-CVD)and spin coating as hard coating agents for their abrasion resistance.Tetraeth-oxysilane(TEOS)was used as the precursor.We formed films by spin coating on surfaces over APG-CVD as adhesive interlayer,and were able to achieve a hard deposited film without any cracks.