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首页> 外文期刊>Journal of molecular modeling >Ab-initio study of anisotropic and chemical surface modifications of β-SiC nanowires
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Ab-initio study of anisotropic and chemical surface modifications of β-SiC nanowires

机译:β-SiC纳米线的各向异性和化学表面改性的从头开始研究

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摘要

The electronic band structure and electronic density of states of cubic SiC nanowires (SiCNWs) in the directions [001], [111], and [112] were studied by means of Density Functional Theory (DFT) based on the generalized gradient approximation and the supercell technique. The surface dangling bonds were passivated using hydrogen (H) atoms and OH radicals in order to study the effects of this passivation on the electronic states of the SiCNWs. The calculations show a clear dependence of the electronic properties of the SiCNWs on the quantum confinement, orientation, and chemical passivation of the surface. In general, surface passivation with either H or OH radicals removes the dangling bond states from the band gap, and OH saturation appears to produce a smaller band gap than H passivation. An analysis of the atom-resolved density of states showed that there is substantial charge transfer between the Si and O atoms in the OHterminated case, which reduces the band gap compared to the H-terminated case, in which charge transfer mainly occurs between the Si and C atoms.
机译:基于广义梯度近似和密度泛函理论,利用密度泛函理论(DFT)研究了立方SiC纳米线(SiCNWs)在[001],[111]和[112]方向的电子能带结构和态电子密度。超级单元技术。为了研究钝化对SiCNWs电子态的影响,使用氢(H)原子和OH自由基对表面的悬空键进行了钝化。计算表明,SiCNWs的电子性质与表面的量子限制,取向和化学钝化有明显的相关性。通常,用H或OH自由基进行的表面钝化会从带隙中除去悬空的键态,并且OH饱和似乎会比H钝化产生更小的带隙。分析原子的分解态密度表明,在OH端接的情况下,Si和O原子之间存在大量电荷转移,与H端接的情况(其中H端接电荷主要发生在Si之间)相比,带隙减小了和C原子。

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