RB—SiC高致密、超光滑SiC表面改性涂层的制备

摘要

为了获得高质量光学表面的碳化硅反射镜，利用射频磁控溅射方法，在直径80mm的RB—SiC基片上沉积了厚约60μm的SiC致密改性涂层，使用传统机械抛光方法对改性层进行超光滑加工，并测试了改性前后的表面粗糙度。结果表明，抛光后SiC表面改性RB—SiC反射镜表面粗糙度均方根（rms）值达到了0．316nm。获得了具有较高光学表面质量的超光滑RB—SiC材料。%In order to manufacture RB-SiC mirrors of fine optical surface, 601zm thick SiC coating was prepared by RF magnetron sputtering on RB-SiC substrate of 80mm diameter and then polished.Tests with ZYGO surface profilometer show that the surface roughness rms of the surface-modified RB-SiC achieves 0.316nm. Therefore, the magnetron sputtered SiC coating can satisfy the requirements of RB-SiC surface modification.