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Effect of Temperature on the Growth of InAs/GaAs Quantum Dots Grown on a Strained GaAs Layer

机译:温度对在应变GaAs层上生长的InAs / GaAs量子点生长的影响

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We have studied the effect of temperature on the growth of InAs quantum dots (QDs) grown on a strained GaAs layer. The 2.0 nm thick, strained GaAs was obtained by growing it on a relaxed In{sub}0.15Ga{sub}0.85As layer. We observed that the density of QDs grown in this manner strongly depends on the growth temperature. A change in the growth temperature from 510℃ to 460℃ resulted in a large increase in the QD density from 2.3 × 10{sup}10 cm{sup}(-2) to 6.7 × 10{sup}10 cm{sup}(-2) and a sharp reduction in their height from 8.0 nm to 3.0 nm. Photoluminescence (PL) results from these QDs are also presented.
机译:我们已经研究了温度对在应变GaAs层上生长的InAs量子点(QD)生长的影响。通过在松弛的In {sub} 0.15Ga {sub} 0.85As层上生长可得到2.0 nm厚的应变GaAs。我们观察到以这种方式生长的量子点的密度强烈取决于生长温度。生长温度从510℃变为460℃,导致量子点密度从2.3×10 {sup}(-2)大幅增加到6.7×10 {sup} 10 cm {sup}( -2)并将其高度从8.0 nm急剧减小到3.0 nm。还介绍了这些QD的光致发光(PL)结果。

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