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An Optimized Super-Junction VDMOS with Breakdown Voltage Over 600 V

机译:击穿电压超过600 V的优化超级结VDMOS

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摘要

Super-Junction (SJ) VDMOS has emerged and become the focus due to its on-resistance can be reduced by one-fifth under the same breakdown voltage compared with conventional VDMOS. For enhancing the property of SJ-VDMOS, in this paper, the analytical model for the relation among the key electrical parameters (breakdown voltage and on-resistance), geometrical structure and physics parameters of SJ-VDMOS can be established by device physics theories firstly. On such basis of it, an optimized of SJ-VDMOS is proposed by ISE-TCAD simulation. Meantime, we obtain its microscopic distribution (current density, electrostatic potential, electric field, space-charge region) and evaluation of electrical properties (breakdown characteristic, output characteristic). The results of simulation shows the breakdown voltage of the optimized SJ-VDMOS is closely 700 V, and the on-resistance is only 0.11375 Ω · mm~2. Our optimized results will provide important theoretical references to design and produce SJ-VDMOS.
机译:与常规VDMOS相比,在相同的击穿电压下其导通电阻可以减小五分之一,因此超级结(SJ)VDMOS成为了人们关注的焦点。为了增强SJ-VDMOS的性能,本文首先通过器件物理理论建立了SJ-VDMOS的关键电参数(击穿电压和导通电阻),几何结构和物理参数之间关系的解析模型。 。在此基础上,通过ISE-TCAD仿真对SJ-VDMOS进行了优化。同时,我们获得其微观分布(电流密度,静电势,电场,空间电荷区域)和电性能评估(击穿特性,输出特性)。仿真结果表明,优化后的SJ-VDMOS的击穿电压接近700 V,导通电阻仅为0.11375Ω·mm〜2。我们的优化结果将为设计和生产SJ-VDMOS提供重要的理论参考。

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