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首页> 外文期刊>Journal of Korean Institute of Metal and Materials >Fracture Strength Improvement of Semiconductor Devices Encapsulated Using a Lead-on-Chip Packaging Technique
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Fracture Strength Improvement of Semiconductor Devices Encapsulated Using a Lead-on-Chip Packaging Technique

机译:使用片上引线封装技术封装的半导体器件的断裂强度提高

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This article describes how the flexural displacement-induced fracture strength of a lead-on-chip (LOC) package is influenced by a density change in SiC-fillers embedded in a package body of 60 wt% to 80 wt% and temperature variation of 25 °C to 300 °C. The experimental results show that the fracture strength of LOC packages increases with an enhanced filler density at a temperature lower than 150 °C, while it is not affected by a filler density change at a temperature higher than 200 °C. Micro-structural examination indicates that the fracture results from crack initiation at the bottom surface of the plastic package body at a temperature lower than 150 °C. On the other hand, at a temperature higher than 200 °C, delamination between the silicon device and the plastic package body takes place first, and then chip cracking follows without package body damage. Thus, at the temperatures higher than 200 °C, enhanced filler density in a package body does not contribute to the improvement of package fracture strength. Furthermore, this work shows that regardless of filler density variation, the fracture strength of the packages having the silicon devices with grinding-induced scratch marks is lower than that with no scratch marks at a temperature higher than 200 °C.
机译:本文介绍了60-80%(重量)的封装体中嵌入的SiC填充物的密度变化如何影响芯片上引线(LOC)封装的挠曲位移诱发的断裂强度。 °C至300°C。实验结果表明,在低于150°C的温度下,LOC包装的断裂强度随填充密度的增加而增加,而在高于200°C的温度下,填充密度的变化则不受其影响。微观结构检查表明,断裂是由于在低于150°C的温度下在塑料封装体底部表面产生裂纹而导致的。另一方面,在高于200℃的温度下,首先在硅器件和塑料封装体之间发生分层,然后在不破坏封装体的情况下发生芯片破裂。因此,在高于200℃的温度下,包装体中填充物密度的增加不会有助于包装体断裂强度的提高。此外,这项工作表明,在高于200°C的温度下,具有填充剂的硅器件的破裂强度与没有研磨痕迹的硅器件相比,都低,而填充剂密度变化却不大。

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