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Effects of Plating Conditions on Thickness and Surface Roughness of Electroless-Plated Cu Deposits

机译:电镀条件对化学镀铜镀层厚度和表面粗糙度的影响

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摘要

Copper thin films were coated on polyethylene terephthalate(PET) substrates by electroless plating. The effects of the ultra-sonication, the initial roughness of the PET substrates, and the plating time on the thickness and roughness of the electroless-plated Cu deposits were studied. The thickness and roughness of the Cu deposits were measured by scanning electron microscopy(SEM) observations and a surface profiler. In the early stage of Cu plating, the ultra-sonication and high initial roughness of the PET substrates promoted an increase in the thickness of the Cu deposits, but they suppressed the increase in thickness of the Cu deposits when plated for a long time. The surface roughness of the Cu deposits plated on PET with a very low initial roughness increased with plating time due to the agglomeration of Cu atoms. However, the surface roughness of the Cu deposits on the PET with a high initial roughness decreased with increasing plating time, since the deep valleys of the rough PET surface were filled with Cu atoms preferentially.
机译:通过化学镀将铜薄膜涂覆在聚对苯二甲酸乙二醇酯(PET)基底上。研究了超声处理,PET基材的初始粗糙度和电镀时间对化学镀铜沉积物厚度和粗糙度的影响。通过扫描电子显微镜(SEM)观察和表面轮廓仪测量Cu沉积物的厚度和粗糙度。在镀铜的早期阶段,PET基板的超声处理和高初始粗糙度促进了Cu沉积物厚度的增加,但是当长时间镀覆时,它们抑制了Cu沉积物厚度的增加。由于铜原子的团聚,以非常低的初始粗糙度电镀在PET上的铜沉积物的表面粗糙度随电镀时间的增加而增加。然而,由于电镀前表面粗糙度的深谷部优先被铜原子填充,因此初始粗糙度较高的PET上的Cu沉积物的表面粗糙度随着镀敷时间的增加而降低。

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