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首页> 外文期刊>Journal of Electronic Materials >Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers
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Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers

机译:4H-SiC外延层中位错引起的表面生长坑的隧道原子力显微镜研究

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摘要

The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.
机译:利用隧道原子力显微镜对4H-SiC外延层中的位错造成的表面生长坑的形貌和电学性质进行了表征。在金属涂层的原子力显微镜尖端和SiC之间观察到尖端电流的特征分布,该尖端电流是在大型表面生长坑内由螺纹螺钉错位引起的。电流高度集中在凹坑内部,并且仅在凹坑底部附近的向上方向的倾斜表面上发生。本文讨论了在表面生长坑内观察到的尖端电流分布的原因和可能的机理。

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