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Correlation of CdZnTe(211)B Substrate Surface Morphology and HgCdTe(211)B Epilayer Defects

机译:CdZnTe(211)B衬底表面形态与HgCdTe(211)B外延层缺陷的相关性

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We present results on the surface morphology and recombination lifetimes of molecular-beam epitaxy(MBE)-grown HgCdTe(211)B epilayers and correlate them with the roughness of the CdZnTe substrate surfaces.The substrate surface quality was monitored by in-situ spectroscopic ellipsometry(SE)and reflection high-energy electron diffraction(RHEED).The SE roughness of the substrate was measured after oxide desorption in the growth chamber.The RHEED patterns collected show a strong correlation with the SE roughness.This proves that SE is a valuable CdZnTe prescreening tool.We also found a correlation between the substrate roughness and the epilayer morphologies.They are characterized by a high density of thin elongated defects,"needle defects,"which appear on most samples regardless of growth conditions.The HgCdTe epilayers grown on these substrates were characterized by temperature-dependent,photoconductive decay-lifetime data.Fits to the data indicate the presence of mid-gap recombination centers,which were not removed by 250°C/24-h annealing under a Hg-rich atmosphere.These centers are believed to originate from bulk defects rather than Hg vacancies.We show that Te annealing and CdTe growth on the CdZnTe substrates smooth the surface and lower substantially the density of needle defects.Additionally,a variety of in-terfacial layers were also introduced to reduce the defect density and improve the overall quality of the epilayer,even in the presence of less than perfect substrates.Both the perfection of the substrate surface and that of its crystalline structure are essential for the growth of high-quality material.Thus,CdZnTe surface polishing procedures and growth techniques are crucial issues.
机译:我们介绍了分子束外延(MBE)生长的HgCdTe(211)B外延层的表面形态和复合寿命的研究结果,并将它们与CdZnTe衬底表面的粗糙度相关联。通过原位光谱椭圆仪监测衬底表面质量(SE)和反射高能电子衍射(RHEED)。在生长室中对氧化物进行解吸后测量了衬底的SE粗糙度,所收集的RHEED图案与SE粗糙度有很强的相关性,这证明SE是有价值的CdZnTe预筛选工具。我们还发现了基材粗糙度与外延层形态之间的相关性。它们的特征是高密度的细长的缺陷(“针状缺陷”)出现在大多数样品上,而与生长条件无关。这些底物的特征在于与温度有关的光导衰变寿命数据。对这些数据的拟合表明存在中间间隙重组细胞在富Hg的气氛下250°C / 24-h退火并没有消除这些杂质。这些中心被认为是由于体缺陷而不是汞空位而引起的。此外,还引入了各种界面层来降低缺陷密度并改善外延层的整体质量,即使存在的基材不够理想也是如此。因此,CdZnTe表面抛光工艺和生长技术是至关重要的问题。

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