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Current status of the growth of HgCdTe by molecular beam epitaxy on (211)B CdZnTe substrates

机译:(211)B CdZnTe衬底上分子束外延生长HgCdTe的现状

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Abstract: We discuss the influence of the Hg flux on defect formation and we show that under optimized growth parameters the crystal quality of HgCdTe epilayer is similar to that of the CdZnTe substrate. We confirm the MBE growth of HgCdTe requires stringent control in growth conditions and occurs under Te saturated conditions. We show also that diffusion of impurities originating from the substrates is a very serious problem. Indium doped HgCdTe layers have been found to exhibit excellent structural and electrical characteristics.!7
机译:摘要:我们讨论了汞通量对缺陷形成的影响,并表明在优化的生长参数下,HgCdTe外延层的晶体质量与CdZnTe基体相似。我们证实,HgCdTe的MBE生长需要严格控制生长条件,并在Te饱和条件下发生。我们还表明,源自基板的杂质扩散是一个非常严重的问题。已发现掺铟的HgCdTe层具有出色的结构和电气特性。7

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