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Current status of the growth of HgCdTe by molecular beam epitaxy on (211)B CdZnTe substrates

机译:分子束外延对(211)B Cdznte基材的HGCDTE生长的当前状态

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We discuss the influence of the Hg flux on defect formation and we show that under optimized growth parameters the crystal quality of HgCdTe epilayer is similar to that of the CdZnTe substrate. We confirm the MBE growth of HgCdTe requires stringent control in growth conditions and occurs under Te saturated conditions. We show also that diffusion of impurities originating from the substrates is a very serious problem. Indium doped HgCdTe layers have been found to exhibit excellent structural and electrical characteristics.
机译:我们讨论Hg通量对缺陷形成的影响,我们表明,在优化的生长参数下,HGCDTE脱蛋白的晶体质量类似于Cdznte衬底的晶体质量。我们确认HGCDTE的MBE生长需要严格控制生长条件,并在TE饱和条件下发生。我们还表明,源自基板的杂质的扩散是一个非常严重的问题。已发现掺杂掺杂的HGCDTE层表现出优异的结构和电气特性。

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