首页> 外文期刊>Journal of Electronic Materials >In-Situ Ellipsometry Studies of Adsorption of Hg on CdTe(211)B/Si(211) and Molecular Beam Epitaxy Growth of HgCdTe(211)B
【24h】

In-Situ Ellipsometry Studies of Adsorption of Hg on CdTe(211)B/Si(211) and Molecular Beam Epitaxy Growth of HgCdTe(211)B

机译:Hg在CdTe(211)B / Si(211)上的吸附及HgCdTe(211)B的分子束外延生长的原位椭偏研究

获取原文
获取原文并翻译 | 示例
       

摘要

We study the adsorption of Hg on CdTe(211)B using an 88-wavelength spec-troscopic ellipsometer mounted on a commercial,molecular beam epitaxy (MBE) chamber.A detailed analysis of the pseudo-dielectric function shows that Hg is present at the surface both in chemisorbed and physisorbed form.Effective medium models for a mixture of chemisorbed and physisorbed Hg on the microscopically rough CdTe surface could not fit our data.However,a proposed model in which a partial layer of physisorbed Hg sits on top of a partial layer of chemisorbed Hg fits the measured pseudo-dielectric function well and yields precise values for the thicknesses of the chemisorbed and the physisorbed Hg layers.These values change in the expected manner as a function of Hg flux,temperature,and Te coverage.An analysis of the uncertainty in the measured thicknesses is carried out in detail,and a study of the limitations of the ellipsometer used for this study is presented.The effects of these limitations on the precision and accuracy of in-situ data are enumerated.
机译:我们使用安装在商业分子束外延(MBE)腔上的88波长光谱椭圆仪研究了汞在CdTe(211)B上的吸附。对伪介电函数的详细分析表明,汞存在于CdTe(211)B上。化学吸附和物理吸附形式的汞的有效介质模型在微观粗糙的CdTe表面上均不适合我们的数据。化学吸附Hg层很好地拟合了测得的伪介电函数,并获得了化学吸附Hg和物理吸附Hg层厚度的精确值,这些值以预期方式随Hg通量,温度和Te覆盖率的变化而变化。详细介绍了测量厚度的不确定性,并介绍了用于该研究的椭圆仪的局限性。这些局限性对精确度的影响列举了现场数据的准确性和准确性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号