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首页> 外文期刊>Journal of Electronic Materials >Fabrication and Characterization of CZTS Thin Films Prepared by the Sulfurization of RF-Sputtered Stacked Metal Precursors
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Fabrication and Characterization of CZTS Thin Films Prepared by the Sulfurization of RF-Sputtered Stacked Metal Precursors

机译:射频溅射堆叠金属前驱体硫化制备CZTS薄膜的表征

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摘要

In this work, Cu2ZnSnS4 (CZTS) thin films were prepared by the sulfurization of metal precursors deposited sequentially via radio frequency magnetron sputtering on Mo-coated soda-lime glass. The stack order of the precursors was Mo/Zn/Sn/Cu. Sputtered precursors were annealed in sulfur atmosphere with nine different conditions to study the impact of sulfurization time and substrate temperature on the structural, morphological, and optical properties of the final CZTS films. X-ray fluorescence was used to determine the elemental composition ratio of the metal precursors. Final CZTS films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive spectroscopy (EDS). XRD and EDS were combined to investigate the films' structure and to identify the presence of secondary phases. XRD analysis indicated an improvement in film crystallinity with an increase of the substrate temperature and annealing times. Also indicated was the minimization and/or elimination of secondary phases when the films experienced longer annealing time. EDS revealed slight Sn loss in films sulfurized at 550A degrees C; however, an increase of the sulfurization temperature to 600A degrees C did not confirm these results. SEM study showed that films treated with higher temperatures exhibited dense morphology, indicating the completion of the sulfurization process. The estimated absorption coefficient was on the order of 10(4) cm(-1) for all CZTS films, and the values obtained for the optical bandgap energy of the films were between 1.33 eV and 1.52 eV.
机译:在这项工作中,Cu2ZnSnS4(CZTS)薄膜是通过将经过射频磁控溅射依次沉积在镀Mo钠钙玻璃上的金属前驱体硫化而制备的。前体的堆叠顺序是Mo / Zn / Sn / Cu。将溅射的前驱体在硫气氛中以九种不同条件进行退火,以研究硫化时间和基材温度对最终CZTS膜的结构,形态和光学性质的影响。 X射线荧光用于确定金属前体的元素组成比。最终的CZTS薄膜通过X射线衍射(XRD),扫描电子显微镜(SEM)和能量色散光谱(EDS)进行表征。 XRD和EDS结合起来研究了薄膜的结构并确定了第二相的存在。 XRD分析表明,随着基板温度和退火时间的增加,膜的结晶度得到改善。还指出的是,当膜经历更长的退火时间时,次级相的最小化和/或消除。 EDS显示在550A℃硫化的薄膜中锡的损失很小。但是,将硫化温度提高到600A℃并不能证实这些结果。 SEM研究表明,高温处理后的薄膜表现出致密的形貌,表明硫化过程已经完成。所有CZTS薄膜的估计吸收系数约为10(4)cm(-1),薄膜的光学带隙能量值介于1.33 eV和1.52 eV之间。

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