ALGORITHMS FOR OPTICAL CONTROL OF REACTIVE MAGNETRON DEPOSITION OF FILM COATINGS

摘要

Algorithms for optical control of a reactive gas flow rate are considered for processes of magnetron deposition of film coatings. The algorithms are based on registration of spectral elements (lines, bands) of a cathode material and reactive/inert gases in magnetron discharge plasma spectra. The influence of instabilities in the magnetron discharge power and vacuum chamber pressure on the composition of the deposited flow and gaseous medium was studied for titanium oxide and nitride deposition that were carried out using various algorithms for optical control of the reactive gas flow rate.