Reactive deposition of oxides e.g. aluminum oxide of a pipe magnetron arrangement in vacuum coating plants, by guiding substrate in longitudinal extension of vacuum coating plant at pipe magnetron arrangement

摘要

The method comprises guiding a substrate (9) in a longitudinal extension of a vacuum coating plant at a pipe magnetron arrangement (1) passing transverse to an axial direction of a rotating pipe magnetron (2), forming the substrate along the longitudinal extension of the pipe magnetron in the axial direction of a plasma over a racetrack (8), and introducing a reactive gas into a process space. A process gas is introduced into the space seen from the substrate after a pipe target (3) between a gas conduit unit and the surface of the pipe target. The method comprises guiding a substrate (9) in a longitudinal extension of a vacuum coating plant at a pipe magnetron arrangement (1) passing transverse to an axial direction of a rotating pipe magnetron (2), forming the substrate along the longitudinal extension of the pipe magnetron in the axial direction of a plasma over a racetrack (8), and introducing a reactive gas into a process space. A process gas is introduced into the space seen from the substrate after a pipe target (3) between a gas conduit unit and the surface of the pipe target. The pipe target is surrounded by the process gas, where both power density and process gas flux are adjusted in such a way that an unique connection exists between a reactive gas flow and a deposition rate, where the pipe magnetron arrangement comprises pipe magnetrons with the pipe target. The reactive gas flow is adjusted in such a way that the smallest possible increment of the reactive gas flow is smaller than a distance between points with the largest absolute value of a curvature in a curve of a normalized separation rate toward a reactive gas flow axis. The reactive gas flow is adjusted on both sides of the pipe magnetron arrangement separated from one another in such a way that a ratio of the flux of the reactive gas on both sides to each other adjusts a same stoichiometry of the plasma over the racetrack. An optical emission spectrum of the plasma is measured at both sides of the pipe magnetron arrangement. Intensities of significant emission lines are adjusted over the ratio of the reactive gas flow of both sides. Two reactive gases such as oxygen and nitrogen are separately introduced on both sides of the pipe magnetron arrangement along the longitudinal extension in the axial direction of the pipe target into process space. The ratio of the first reactive gas such as oxygen to the second reactive gas such as nitrogen is smaller than 1. The pipe magnetron arrangement comprises two anodes that are mutually switched. The pipe magnetrons are operated in a center frequency of a pulsed mode. An independent claim is included for an arrangement for gas supply at a pipe magnetron arrangement in vacuum coating plants.