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Deposition of cerium oxide thin films by reactive magnetron sputtering for the development of corrosion protective coatings

机译:反应磁控溅射沉积氧化铈薄膜以开发防腐蚀涂层

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摘要

As an alternative to chromate based coatings cerium oxide thin films were deposited by magnetron sputtering on Al clad 2024 alloy in order to evaluate their corrosion protection potential. Varying plasma properties by modifying O_2 content during deposition allowed to affect the chemistry and microstructure of the synthesized films. The electrochemical characterization showed that specific self-healing mechanisms are suspected for the samples deposited with the highest amount of oxygen. Those mechanisms, leading to the reinforcement of barrier properties versus immersion time in NaCl solution, are associated with the interaction between alumina and cerium oxide film in the presence of electrolyte.
机译:作为基于铬酸盐的涂层的替代,通过磁控溅射在铝包层2024合金上沉积氧化铈薄膜,以评估其腐蚀防护潜力。通过在沉积过程中改变O_2的含量来改变等离子体性能,可以影响合成膜的化学和微观结构。电化学表征表明,对于沉积有最多氧气的样品,怀疑有特定的自愈机制。这些机制导致阻隔性能相对于在NaCl溶液中的浸没时间的增强,与存在电解质时氧化铝和氧化铈薄膜之间的相互作用有关。

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  • 来源
    《Corrosion science》 |2013年第10期|158-168|共11页
  • 作者单位

    Chimie des Interactions Plasma Surface (CMPS), CIRMAP, University of Mons, 23 Place du Pare, B-7000 Mons, Belgium;

    Service de Science des Materiaux, University of Mons, 23 Place du Parc, B-7000 Mons, Belgium;

    Materia Nova, Parc Initialis, 1 av. Copernic, B-7000 Mons, Belgium;

    Materia Nova, Parc Initialis, 1 av. Copernic, B-7000 Mons, Belgium;

    Chimie des Interactions Plasma Surface (CMPS), CIRMAP, University of Mons, 23 Place du Pare, B-7000 Mons, Belgium,Materia Nova, Parc Initialis, 1 av. Copernic, B-7000 Mons, Belgium;

    Service de Science des Materiaux, University of Mons, 23 Place du Parc, B-7000 Mons, Belgium,Materia Nova, Parc Initialis, 1 av. Copernic, B-7000 Mons, Belgium;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A. Aluminium; C. XPS; B. Polarization; B. EIS;

    机译:A.铝C.XPS;B.极化;B.EIS;

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