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Properties and mechanism of solar absorber CdTe thin film synthesis by unipolar galvanic pulsed electrodeposition

机译:单极电流脉冲电沉积合成太阳吸收体CdTe薄膜的性质和机理。

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摘要

Electrochemical deposition of CdTe semicon_ductor thin films over transparent conducting glass substrates by sequential unipolar current pulses is described. The magnitude of pulsed current and pulse periodicity affects the crystalline structure, morphology, optical absorbance and composition of CdTe films. CdTe films formed under high magnitude pulsed current density 5-15 mA cm~(-2) are crystalline with dominant cubic structure having (111) plane oriented parallel to the sub_strate. Stoichiometric CdTe film growth occurs with current pulses of short 25-300 ms periodicity and 3-50 ms duration. A mechanism of the CdTe growth involving in situ cathodic tellurization process step involving H_2Te formation and reaction with electrochemically deposited Cd monolayer is described. CdTe film growth in the pulsed electrodeposition occurs under mass transport conditions under strong influence of high magnitude pulsed current. This results in much higher growth rates__ 5-8 _m h~(-1) for CdTe films which is attractive for CdTe solar cells in a production environment.
机译:描述了通过连续的单极电流脉冲在透明导电玻璃基板上电化学沉积CdTe半导体薄膜的方法。脉冲电流的大小和脉冲周期会影响CdTe薄膜的晶体结构,形态,吸光度和组成。在高强度脉冲电流密度为5-15 mA cm〜(-2)的条件下形成的CdTe薄膜是具有主导立方结构的晶体,该立方结构的(111)平面与基板平行。化学计量的CdTe薄膜生长是在短的25-300 ms周期和3-50 ms持续时间的电流脉冲下发生的。描述了CdTe生长的机制,该过程涉及原位阴极碲化工艺步骤,该步骤涉及H_2Te的形成以及与电化学沉积的Cd单层的反应。脉冲电沉积中CdTe膜的生长在高强度脉冲电流的强烈影响下在质量传输条件下发生。这导致CdTe薄膜的生长速率更高,达到5-8 _m h〜(-1),这对于生产环境中的CdTe太阳能电池具有吸引力。

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