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首页> 外文期刊>JETP Letters >Effect of surface defects and few-atomic steps on the local density of states of the atomically-clean surface of Bi2Se3 topological insulator
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Effect of surface defects and few-atomic steps on the local density of states of the atomically-clean surface of Bi2Se3 topological insulator

机译:表面缺陷和少几个原子步长对Bi2Se3拓扑绝缘子原子清洁表面状态局部密度的影响

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摘要

The results of ultrahigh vacuum low-temperature scanning-tunneling microscopy (STM) and spectroscopy (STS) of atomically clean (111) surface of the topological insulator Bi2Se3 are presented. We observed several types of new subsurface defects whose location and charge correspond to p-type conduction of grown crystals. The sign of the thermoelectric effect also indicates p-type conduction. STM and STS measurements demonstrate that the chemical potential is always located inside the bulk band gap. We also observed changes in the local density of states in the vicinity of the quintuple layer steps at the studied surface. This changes correspond either to the shift of the Dirac cone position or to the shift of the chemical potential near the step edge.
机译:给出了拓扑绝缘子Bi2Se3原子清洁(111)表面的超高真空低温扫描隧道显微镜(STM)和光谱(STS)的结果。我们观察到了几种新的表面缺陷,它们的位置和电荷与生长的晶体的p型传导相对应。热电效应的符号还指示p型传导。 STM和STS测量表明,化学势始终位于体带隙内。我们还观察到在研究表面上五重层台阶附近的状态局部密度的变化。这种变化要么对应于狄拉克锥位置的偏移,要么对应于阶梯边缘附近化学势的偏移。

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