首页> 外文期刊>Diamond and Related Materials >The origin of shallow n-type conductivity In boron-doped diamond with H or S co-doping: Density functional theory study
【24h】

The origin of shallow n-type conductivity In boron-doped diamond with H or S co-doping: Density functional theory study

机译:H或S共掺杂硼掺杂金刚石中浅n型导电性的起源:密度泛函理论研究

获取原文
获取原文并翻译 | 示例
           

摘要

The ionization potentials and the electron affinities of doped diamond were calculated using B3LYP hybrid density functional theory and nanocrystalline cluster models, while taking into account the quantum confinement of the charge earners. In many cases donor and acceptor levels were created in the middle of the gap between the conduction and valence bands. A possible explanation for the n-type behavior created by co-doping diamond films with boron and sulfur is given in terms of thermally activated electron donation from an SVS (V is vacancy) donor to a BB acceptor band. Both lie deep in the band gap. It is proposed that electrons in the BB acceptor band are mobile charge earners. It is also proposed that the conversion of boron-doped diamond from p-type conductivity, with hole charge earners in the top of the valence band, to n-type conductivity, following treatment in a deuterium plasma, may arise from formation of interstitial hydrogen donor levels and B_nH_m acceptor levels that create an acceptor band in which electrons are mobile. Again, both are deep in the band gap of pure diamond. In a prior attempt to explain this n-type behavior, B_nH_m defects with unrelaxed structures were proposed to be shallow donors to the diamond conduction band. This paper shows that these defects become deep donors when their structures are optimized. Finally, defects created from vacancies with 1 to 4 H in them are shown to be deep donors to the diamond conduction band.
机译:使用B3LYP杂化密度泛函理论和纳米晶簇模型,计算了掺杂金刚石的电离势和电子亲和力,同时考虑了电荷载体的量子约束。在许多情况下,供体和受体水平是在导带和价带之间的间隙中间产生的。通过将金刚石膜与硼和硫共掺杂产生的n型行为的可能解释,是根据从SVS(V为空位)供体向BB受体带的热活化电子给体给出的。两者都位于带隙的深处。有人提出,BB受体带中的电子是移动电荷的获得者。也有人提出,在氘等离子体中进行处理后,掺硼金刚石从p型电导率(在价带的顶部具有空穴电荷载体)到n型电导率的转化可能是由间隙氢的形成引起的。施主能级和B_nH_m受主能级形成电子在其中移动的受主带。同样,两者都深陷于纯钻石的带隙中。在解释这种n型行为的先前尝试中,提出了具有非松弛结构的B_nH_m缺陷是金刚石导带的浅施主。本文表明,当优化其结构时,这些缺陷会成为深层的供体。最后,由空位中1至4 H产生的缺陷被证明是金刚石导带的深施主。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号