Synthesis of amorphous carbon nitride using reactive ion beam sputtering deposition with grazing bombardment

摘要

Amorphous carbon nitride (a-C:N) thin films were synthesised on steel substrates using reactive ion beam sputtering deposition (RIBSD). A single ion beam is arranged to sputter the graphite target at 75 deg incidence and concurrently bombard the growing film at grazing incidence angles of the ion beam. Nanoindentation, Raman spectroscopy, FTIR, FT-Raman and XPS were employed to characterise the mechanical and structural properties of the films. It was found that grazing incident bombardment has a significant effect on film structure through an increase in nitrogen content and formation of nitrogen doped structure.