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The ion-beam reactive sputtering process for deposition of niobium nitride thin films

机译：用于沉积氮化铌薄膜的离子束反应溅射工艺

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by Daniel Jenner Lichtenwalner.

机译：由Daniel Jenner Lichtenwalner撰写。

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Lichtenwalner Daniel Jenner;
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年度 1990
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正文语种 eng
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1. Process simulation of reactive DC magnetron sputtering for thin film deposition of niobium-titanium nitride [J] . Maezawa H., Sato T., Noguchi T. IEEE Transactions on Applied Superconductivity . 2005,第2期

机译：反应性直流磁控溅射溅射沉积铌钛氮化物的过程模拟
2. Reactively sputtered niobium nitride thin films for Josephson integrated circuit application [J] . Lee S.Y., Bruns M. IEEE Transactions on Applied Superconductivity . 1993,第1期

机译：用于约瑟夫森集成电路应用的反应溅射氮化铌薄膜
3. Nanoindentation study of niobium nitride thin films on niobium fabricated by reactive pulsed laser deposition [J] . Al Mamun Md Abdullah, Farha Ashraf Hassan, Ufuktepe Yuksel, Applied Surface Science . 2015,第mara1期

机译：反应性脉冲激光沉积在铌上制备氮化铌薄膜的纳米压痕研究
4. ATOMIC LAYER DEPOSITION OF NIOBIUM NITRIDE AND NIOBIUM SILICON NITRIDE THIN FILMS FOR METAL ELECTRODES [C] . H. Huotari, S. Haukka, R. Matero, Electrochemical Society . 2006

机译：金属电极氮化铌和铌氮化硅薄膜的原子层沉积
5. Deposition and Characterization of Indium Nitride and Aluminum Nitride Thin Films by Reactive Sputtering [D] . ?Atluri, Sushma Swaraj 2020

机译：沉积和氮化铟的表征和氮化铝薄膜的反应溅射
6. In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride [O] . Bärbel Krause, Dmitry S. Kuznetsov, Andrey E. Yakshin, -1

机译：镧的非反应性溅射沉积和氮化镧的反应性溅射沉积过程中结构形成的原位和实时监测
7. Reactive magnetron sputter deposition of superconducting niobium titanium nitride thin films with different target sizes [O] . Bos, B. G. C., Thoen, D. J., Haalebos, E. A. F., 2016

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The ion-beam reactive sputtering process for deposition of niobium nitride thin films

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