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Initial growth of heteroepitaxial diamond on Ir(001)/MgO(001) substrates using antenna-edge-type microwave plasma assisted chemical vapor deposition

机译:使用天线边缘型微波等离子体辅助化学气相沉积法在Ir(001)/ MgO(001)衬底上初始生长异质外延金刚石

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摘要

Initial growth of heteroepitaxial diamond on Ir (001)/MgO (001) was investigated by scanning electron microscopy, reflection high-energy electron diffraction (RHEED) and atomic force microscopy. Bias-enhanced nucleation (BEN) was performed by antenna-edge-type microwave plasma assisted chemical vapor deposition. In BEN, diamond crystallites nucleated and grew along the [-110] and [110] directions of iridium. Diamond was likely to nucleate on protruded iridium areas. After BEN, in addition to the diamond diffraction spots, iridium bulk diffraction spots, which were not observed before BEN, were observed by RHEED. The iridium surface appeared to be protruded and changed by the high ion current density in BEN. Under [001] selective growth conditions, diamond crystallites, which were less than 10 nm in diameter, were etched by H{sub}2 plasma. Diamond nucleated areas corresponded to the surface ridges of iridium along the [-110] and [110] directions at 10-40 nm intervals before BEN.
机译:通过扫描电子显微镜,反射高能电子衍射(RHEED)和原子力显微镜研究了异质外延金刚石在Ir(001)/ MgO(001)上的初始生长。通过天线边缘型微波等离子体辅助化学气相沉积法进行偏增强成核(BEN)。在BEN中,金刚石微晶沿铱的[-110]和[110]方向成核并生长。钻石可能在突出的铱区域上成核。 BEN之后,除了金刚石衍射斑外,RHEED还观察到了BEN之前未观察到的铱体衍射峰。由于BEN中离子电流密度高,铱表面似乎突出并发生了​​变化。在[001]选择性生长条件下,直径小于10 nm的金刚石微晶被H {sub} 2等离子体蚀刻。金刚石成核区域对应于铱在BEN之前沿[-110]和[110]方向以10-40 nm间隔的铱表面脊。

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