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Interface features of the HPHT Ib substrate and homoepitaxial CVD diamond layer

机译:HPHT Ib衬底与同质外延CVD金刚石层的界面特征

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This is a detailed study of the interface features of the HPHT lb substrate and the homoepitaxial CVD diamond layer. Homoepitaxial diamond layers were prepared by a commercial type 30 kW dc arc plasma Jet CVD on (100) substrates with gas mixture of Ar/H-2/CH4. The internal stress and the fluorescence properties of the cross-section of the single crystal diamond bulk were characterized with polarizer optical microscopy, micro Raman spectroscopy, and photoluminescence, as well as DiamondView luminescence imaging. A higher stress region in the homoepitaxial diamond layer near the substrate with width about 15 mu m was found exhibiting higher nitrogen content and presented different fluorescence properties. Studies on the surface morphology of the initial growth diamond indicated that the transformation of the surface morphology from growth hillocks to macrosteps, may play a crucial role in the interface feature. (C) 2016 Elsevier B.V. All rights reserved.
机译:这是对HPHT 1b基板和同质外延CVD金刚石层的界面特征的详细研究。通过商业类型的30 kW dc电弧等离子喷射CVD在Ar / H-2 / CH4的气体混合物上(100)基板制备同质外延金刚石层。通过偏光镜,显微拉曼光谱,光致发光以及DiamondView发光成像来表征单晶金刚石块体的内部应力和横截面的荧光性质。发现在基板附近的同质外延金刚石层中具有约15μm的宽度的较高应力区域表现出较高的氮含量并且呈现出不同的荧光性质。对初始生长钻石表面形态的研究表明,表面形态从生长小丘到宏观台阶的转变可能在界面特征中起关键作用。 (C)2016 Elsevier B.V.保留所有权利。

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