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SUBSTRATE INCLUDING SILICON LAYER AND DIAMOND LAYER HAVING SILICON-DIAMOND INTERFACE OPTICALLY FINISHED (OR CLOSED)

机译:具有光学完成(或封闭)的硅-金刚石界面的基质(包括硅层和金刚石层)

摘要

To provide a laminated substrate including a silicon layer resistant to stress after growth and a diamond layer.SOLUTION: A laminated substrate includes: a silicon layer 4 having an optically finished surface; and a diamond layer 6 grown by chemical vapor deposition (CVD) on the optically finished surface of the silicon layer 4. In an interface 8 between the silicon layer 4 and the diamond layer 6, the optically finished surface of the silicon layer 4 has a surface roughness (Ra) of 100 nm or less.SELECTED DRAWING: Figure 1
机译:提供一种层压基板,该层压基板包括耐生长后的应力的硅层和金刚石层。解决方案:层压基板包括:具有光学抛光表面的硅层4;以及硅层4。以及在硅层4的光学完成表面上通过化学气相沉积(CVD)生长的金刚石层6。在硅层4与金刚石层6之间的界面8中,硅层4的光学完成表面具有表面粗糙度(Ra)为100 nm或更小选定的图:图1

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