A comparative study of copper electrodeposition and photoelectrodeposition on boron doped diamond

摘要

Copper (Cu) electrodeposition and photoelectrodeposition on highly boron-doped diamond films (BDD) were investigated, at two different pH solutions. Cu particles were deposited in the potentiostat mode and under UV irradiation. The as-grown as well as the Cu modified BDD films were characterized by Raman Spectroscopy and Scanning Electron Microscopy. The copper photocatalytic deposition on BDD was discussed taking into account the influence of the photogenerated electrons for photoelectrodeposition process at both acid and neutral pH solutions. Under UV irradiation, the copper deposits presented higher density and uniformity all over the crystal faces when compared with those without UV irradiation. This behavior may be attributed to BDD semiconductor character due to its photogenerated electrons which enhanced the copper reduction reaction.