Copper photoelectrodeposition onto boron doped diamond electrodes at different doping level to enhance nitrate electroreduction

摘要

Photoelectrodeposition of copper on boron-doped diamond films (BDD) was investigated. In this work, two different doped films were analyzed. Copper particles were deposited in the potentiostat mode and under UV irradiation. The BDD film as-grown and the BDD film modifed with Cu (Cu/BDD) on the surface were characterized by Raman Spectroscopy and Scanning Electron Microscopy (SEM) respectivily. These electrodes were tested as electrocatalysts for nitrate reduction in Britton-Robinson buffer solution (pH=3). Electrochemical measurements showed that the electrode with high doping level displayed the best electrocatalytic activity.