首页> 中文期刊> 《新型炭材料》 >掺硼金刚石薄膜电极分析检测痕量镉、铅、铜、汞

掺硼金刚石薄膜电极分析检测痕量镉、铅、铜、汞

         

摘要

A boron-doped diamond (BDD) thin-film electrode was prepared and used for the simultaneous detection and quantification of Cd(II), Pb (II), Cu (II) and Hg(II) ions using an anodic stripping voltammetry method.The BDD thin film was prepared by a hot filament chemical vapor deposition technique and used as the working electrode in the detection.The influence of experimental parameters, such as scanning mode, working electrode, supporting electrolyte, pH,boron concentration in the BDD electrode, accumulation potential and accumulation time were investigated.Under the optimized conditions, the stripping peak currents showed a good linear relationship with the concentrations of the four heavy metal ions from 1 to 7 ppb, and the results were very reproducible.%采用热丝化学气相沉积方法(HFCVD)制备硼掺杂金刚石(BDD)薄膜电极,并对BDD电极进行了表征和活化处理.以制备的BDD电极为工作电极利用阳极溶出伏安法对镉、铅、铜、汞重金属离子进行检测分析,考察了扫描方式、工作电极、支持电解液、pH值、电极硼掺杂浓度、富集时间、富集电位等因素对检测的影响.在优化实验条件下,对1-7 ppb的镉、铅、铜、汞重金属离子进行了同时检测,结果表明BDD电极对镉、铅、铜、汞重金属离子溶出峰的分离度较好,具有良好的线性度和重复性.

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