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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Low-temperature deposited Titanium-doped zinc oxide thin films on the flexible PET substrate by DC magnetron sputtering
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Low-temperature deposited Titanium-doped zinc oxide thin films on the flexible PET substrate by DC magnetron sputtering

机译:直流磁控溅射在柔性PET衬底上低温沉积钛掺杂的氧化锌薄膜

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摘要

Transparent conducting Titanium-doped zinc oxide thin films (TZO) with high transparency and relatively low resistivity were firstly deposited on water-cooled polyethylene terephthalate (PET) substrates at room temperature by DC magnetron sputtering. The microstructure, optical and electrical properties of the deposited films were investigated and discussed. The XRD patterns show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. The electrical resistivity decreases when the sputtering power increases from 45 W to 60 W. However, as the puttering power continue increases from 60 W to 90 W, the electrical resistivity increases rapidly. When the puttering power is 60 W, the films deposited on PET substrate have the lowest resistivity of 4.72 × 10~(-4) Ω cm and a relatively high transmittance of above 92% in the visible range.
机译:首先在室温下通过直流磁控溅射在水冷聚对苯二甲酸乙二醇酯(PET)基板上沉积具有高透明性和较低电阻率的透明导电掺杂钛的氧化锌薄膜(TZO)。研究和讨论了沉积膜的微观结构,光学和电学性质。 XRD图谱表明,所有沉积的膜都是具有六边形结构的多晶,并且沿垂直于基底的c轴具有优选的取向。当溅射功率从45 W增加到60 W时,电阻率降低。但是,随着轻击功率从60 W继续增加到90 W,电阻率迅速增加。当推杆功率为60 W时,沉积在PET基板上的薄膜的最低电阻率为4.72×10〜(-4)Ωcm,并且在可见光范围内具有相对较高的透射率,高于92%。

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