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Preparation of BST ferroelectric thin film by pulsed laser ablation for dielectric bolometers

机译:介电辐射热计的脉冲激光烧蚀制备BST铁电薄膜

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摘要

Ferroelectric Ba{sub}0.75Sr{sub}0.25TiO{sub}3 (BST) thin film has been prepared for the development of a new-type dielectric bolometer using its temperature dependence of dielectric constant around the Curie temperature (T{sub}c). Pulsed laser deposition method has been employed to deposit BST films on a Pt/Ti/NSG(nondoped silicon glass)/SiN/SiO/Si(1 0 0) substrate. For a better understanding of how to obtain BST thin films with a high-and-sharp dielectric peak around the T{sub}c, X-ray diffraction, atomic force microscopy, D-E hysteresis and C-T characteristics were measured. It was found that the primary factors determining the dielectric behaviors of BST films are grain size and film thickness. BST films with thickness down to 0.6μm prepared at a substrate temperature of more than 550℃ showed some potential, and the crack-free 1μ m-thick highly oriented BST films with some degree of epitaxy can be a good candidate for such ferroelectric microbolometer application.
机译:铁电Ba {sub} 0.75Sr {sub} 0.25TiO {sub} 3(BST)薄膜已经准备好用于开发新型介电辐射热测量计,利用它在居里温度(T {sub} C)。已采用脉冲激光沉积方法在Pt / Ti / NSG(无硅硅玻璃)/ SiN / SiO / Si(1 0 0)衬底上沉积BST膜。为了更好地了解如何获得在T {c}附近具有高且尖锐的介电峰的BST薄膜,测量了X射线衍射,原子力显微镜,D-E磁滞和C-T特性。发现确定BST膜的介电性能的主要因素是晶粒尺寸和膜厚度。在550℃以上的基板温度下制备的厚度仅为0.6μm的BST膜具有一定的潜力,并且具有一定外延的无裂纹的1μm厚的高取向BST膜可以很好地用于这种铁电微辐射热计的应用。 。

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