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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Research on physico-chemical bases of the ion nitriding process control with the use of plasma spectroscopic diagnostics
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Research on physico-chemical bases of the ion nitriding process control with the use of plasma spectroscopic diagnostics

机译:利用等离子体光谱诊断技术研究离子渗氮过程控制的理化基础

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The results of the research which concerns assigning correlation between parameters of the glow discharge plasma, observed by spectroscopic methods, and kinetics of the nitriding process and the nitrided layer structure are presented in the paper. Research on the plasma parameters was carried out for two processes of the ion nitriding enabling creation of two basic structures of the nitrided layer: containing exclusively the diffusion zone α-Fe(N) and containing both, the diffusion zone α-Fe(N) and, the compounds zone ε+γ'. Mass spectra of the gas atmosphere and emission spectra of plasma generated in the near-surface area were recorded at the succeeding stages of processes creating both the above mentioned nitrided layer's structures. On the basis of the obtained results active plasma components, decisive for formation of individual structures of the nitrided layer, were assigned.
机译:本文介绍了有关通过光谱方法观察到的辉光放电等离子体的参数之间的相关性分配以及​​氮化过程和氮化层结构动力学的研究结果。对离子渗氮的两个过程进行了等离子体参数的研究,从而创建了氮化层的两个基本结构:仅包含扩散区α-Fe(N),同时包含扩散区α-Fe(N)化合物区ε+γ'。在产生上述氮化层结构的过程的后续阶段中,记录了在近表面区域产生的气体气氛的质谱和等离子体的发射光谱。基于所获得的结果,分配了对形成氮化层的各个结构起决定性作用的活性等离子体组分。

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