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首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >Optimization of plasma-enhanced chemical vapor deposition parameters for the growth of individual vertical carbon nanotubes as field emitters
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Optimization of plasma-enhanced chemical vapor deposition parameters for the growth of individual vertical carbon nanotubes as field emitters

机译:用于单个垂直碳纳米管作为场发射体生长的等离子体增强化学气相沉积参数的优化

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摘要

In this article plasma enhanced growth of single vertical carbon nanotubes (CNTs) from individual nickel catalyst dots is studied, aiming at the fabrication of CNT field emitters. It is found that the growth of individual CNTs differs from that of CNT forests grown from unpatterned catalyst films, an effect that can be attributed to the difference in catalyst volumes. In the context of growth parameters the influence of temperature, growth time, catalyst volume, pressure and power is characterized. After determining the growth behavior, an individual CNT of desired geometry is fabricated on a conducting lead. The CNT is electrically characterized in terms of its field emission behavior and stable emission currents and its work function is determined to Φ = 5.4 ± 0.2 eV.
机译:在本文中,研究了从单个镍催化剂点等离子体增强单个垂直碳纳米管(CNT)的生长,旨在制造CNT场致发射器。发现单个CNT的生长与从未构图的催化剂膜生长的CNT森林的生长不同,这种影响可以归因于催化剂体积的差异。在生长参数的背景下,表征了温度,生长时间,催化剂体积,压力和功率的影响。确定生长行为后,在导电引线上制作具有所需几何形状的单个CNT。根据其场发射行为和稳定的发射电流对CNT进行电学表征,其功函数确定为Φ= 5.4±0.2 eV。

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