Highly accurate differential deposition for X-ray reflective optics

摘要

Wehavedevelopedahighly accurate differential depositionsystemforthefabrication of X-rayoptical devices.Usingthis system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100mmlong substrate.