HIGH REFLECTIVITY AND HIGH FLUX X-RAY OPTIC ELEMENT AND METHOD OF MAKING SAME USING ATOMIC LAYER DEPOSITION TECHNIQUES

摘要

This invention relates to a method of forming multiple bilayers on a substrateusing an atomic layer deposition process. The reflecting layer of the bilayerpair can be a high electron density metal and the spacing layer of the bilayerpair can be a low electron density material. Because atomic layer depositioncan deposit atomic layer controlled and conformal films, multiple bilayers canbe deposited on the internal surfaces of monocapillary tubes. By applying agraded multiple bilayer, much higher reflectivity and higher flux opticalelements can be obtained than those based on total external reflection.Deposition of a graded multiple bilayer on an elliptic or parabolic taperedtube leads to focused or collimated output from a point source input. Variousatomic, layer deposition techniques are described to produce the gradedmultiple bilayer high quality X-ray focusing devices, especially for "hard" X-~rays.