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Effects of second metal contents on microstructure and micro-hardness of ternary nitride films synthesized by cathodic arc method

机译:第二种金属含量对阴极电弧法合成三元氮化物膜组织和显微硬度的影响

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摘要

Current status of ternary nitride films such as Ti1-XAlXN, Ti1-XCrXN, Ti1-XZrXN, Cr1-XAlXN, Zr1-XAlXN and Ti1-XWXN was briefly summarized focused on micro-hardness with respect to different X value. The cathodic arc method is a specialized method in creating metastable ternary films which cannot be synthesized under stable thermodynamic conditions. The crystal structure and lattice parameter of ternary films change with X value and their physical properties correspondingly change as well. In this paper, the maximum hardness of ternary nitride films with particular X value was discussed based on the phase transition, analyzed by X-ray diffraction (XRD) and scanning and transmission electron microscopy (SEM and TEM). (C) 2004 Elsevier B.V. All rights reserved.
机译:简要总结了三元氮化物薄膜(如Ti1-XAlXN,Ti1-XCrXN,Ti1-XZrXN,Cr1-XAlXN,Zr1-XAlXN和Ti1-XWXN)的现状,着眼于针对不同X值的显微硬度。阴极电弧法是一种专门的方法,用于创建在稳定的热力学条件下无法合成的亚稳态三元膜。三元膜的晶体结构和晶格参数随X值变化,其物理性质也相应变化。本文基于相变讨论了具有特定X值的三元氮化物膜的最大硬度,通过X射线衍射(XRD)以及扫描和透射电子显微镜(SEM和TEM)进行了分析。 (C)2004 Elsevier B.V.保留所有权利。

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