加入10Si 对阴极电弧蒸镀 TiAlSiN 涂层的影响

摘要

研究加入10% Si(摩尔分数)对 TiAlSiN 涂层的影响。采用阴极电弧蒸镀在 WC−Co 基体上沉积 Ti0.5Al0.5N、Ti0.5Al0.4Si0.1N 和 Ti0.55Al0.35Si0.1N 涂层，通过 X 射线衍射(XRD)、 X 射线光电子能谱(XPS)、扫描电镜(SEM)、纳米压痕测量和划痕试验研究涂层的显微组织和力学性能，探讨 Si 对涂层的性能和结合失效模式的影响机理。结果表明：加入10% Si 后，涂层中形成非晶 Si3N4包覆(Ti,Al,Si)N 纳米晶的纳米复合结构。TiAlSiN 涂层的硬度和韧性升高，但结合强度下降。与 Ti0.55Al0.35Si0.1N 涂层相比, Ti0.5Al0.4Si0.1N 涂层的硬度较高但韧性较低。TiAlN 涂层由于韧性低、界面结合强，因此结合失效模式以楔形剥落为主。TiAlSiN 涂层由于韧性改善、但界面结合变差，因此结合失效模式以屈曲剥落为主。%The effect of 10% Si (mole fraction) addition on TiAlSiN coatings was studied. Ti0.5Al0.5N, Ti0.5Al0.4Si0.1N and Ti0.55Al0.35Si0.1N coatings were deposited on WC−Co substrates by cathodic arc evaporation. The microstructure and mechanical properties were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), nano-indentation measurement and scratch test. The mechanisms of how Si affects the properties and failure modes of TiAlSiN coatings were also discussed. The results show that the addition of 10% Si results in the formation of nc-(Ti,Al,Si)N/a-Si3N4 nano-composite structure. The hardness and toughness of TiAlSiN coatings increase, whereas the coating adhesion strength decreases. Compared with Ti0.55Al0.35Si0.1N coating, Ti0.5Al0.4Si0.1N coating has higher hardness but lower toughness. The dominant failure mode of TiAlN coating is wedging spallation due to low toughness and strong interfacial adhesion. The dominant failure mode of TiAlSiN coatings is buckling spallation due to improved toughness and weakened interfacial adhesion.