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Preparation of Cr-doped TiO_2 thin film of P-type conduction for gas sensor application

机译:用于气体传感器的P型导电Cr掺杂TiO_2薄膜的制备

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摘要

Titanium dioxide (TiO_2) could be doped with as much as 8.7% atom% Cr by meansof a sol-gel method.XRD analysis revealed that the powder of Cr(8.7 atom%)-doped TiO_2 calcined at 500degC consisted of small crystallites ascribale to anatase structure.The thin film of doped TiO_2 (70 mum) at this composition was found to behave as a p-type semiconductor on exposure to CO and NO_2 inair:it responded to dilute NO_2 with a sharp decrease in electrical resistance.
机译:通过溶胶-凝胶法可将二氧化钛(TiO_2)掺入高达8.7%原子%的Cr。XRD分析表明,在500℃煅烧的掺Cr(8.7%(原子))的TiO_2粉末由细小结晶组成。发现在这种成分下,掺杂的TiO_2(70 mum)薄膜在暴露于CO和NO_2的情况下表现为p型半导体:它对稀释的NO_2产生响应,电阻急剧降低。

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