首页> 外文期刊>Technical physics letters: Letters to the Russian journal of applied physics >Magnesium outdiffusion from porous silicon carbide substrates during autodoping of gallium nitride epilayers
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Magnesium outdiffusion from porous silicon carbide substrates during autodoping of gallium nitride epilayers

机译:自动掺杂氮化镓外延层期间,镁从多孔碳化硅衬底中扩散出来

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摘要

We have studied the outdiffusion of magnesium from silicon carbide substrates during autodoping of gallium nitride epilayers. The autodoping effect was observed in the case of porous substrates obtained by surface anodization of 6H-SiC wafers. It is established that the magnesium distribution profiles can be controlled by post-growth annealing. The fact of doping is confirmed by the results of photoluminescence measurements at 77 K.
机译:我们已经研究了在自动掺杂氮化镓外延层期间,镁从碳化硅衬底中的扩散。在通过6H-SiC晶片的表面阳极氧化获得的多孔基板的情况下,观察到自动掺杂效果。已确定可以通过生长后退火来控制镁分布曲线。掺杂的事实由在77 K下的光致发光测量结果证实。

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