首页> 外文期刊>Physical Review, B. Condensed Matter >ELECTRONIC STRUCTURE OF DEFECTS AND IMPURITIES IN III-V NITRIDES .2. BE, MG, AND SI IN CUBIC BORON NITRIDE
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ELECTRONIC STRUCTURE OF DEFECTS AND IMPURITIES IN III-V NITRIDES .2. BE, MG, AND SI IN CUBIC BORON NITRIDE

机译:III-V氮化物中缺陷和杂质的电子结构.2。立方氮化硼中的BE,MG和SI

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The electronic structure of beryllium (Be), magnesium (Mg), and silicon (Si) impurities in zinc-blende boron nitride (c-BN) were studied by using the tight-binding linearized muffin-tin-orbitals technique. Calculations were performed using 64-atom supercells centered on either a boron (B) or a nitrogen (N) lattice site. While Be and Mg impurities were substituted only to the B sublattice, substitutions for both B and N were considered in the case of the Si impurity. In each case, total-energy minimization was used to examine lattice relaxation near the impurity site, and the nature of chemical bonding between the impurity and the neighboring atoms of the host crystal was examined in detail. We find that Be and Mg substituted for B each create delocalized levels merged to the states at the valence-band edge. These partially-occupied levels dan result in p-type conductivity such as that which has been observed experimentally. In contrast to the behavior pf isolated Be and Mg impurities in c-BN, we find that Si substituted at a B site induces delocalized impurity states that overlap with the conduction-band edge of the host. These levels can contribute to the n-type conductivity of Si-doped c-BN. Si substituted to the anion sublattice induces sharp, partially occupied, and highly localized levels within the forbidden gap (''deep acceptor levels''). The experimentally observed mixture of n- and p-type c-BN can therefore be accounted for by the presence of impurities of each type. The relaxation of the host lattice near the Be and Mg impurities is outward, as is the relaxation near the Si impurity substituted at a N site. Inward relaxation is predicted in the case of Si substituted for B. The total, orbital, and shell-projected densities of states for the impurity and up to six coordinational shells nearest the impurity are analyzed in detail. Charge-density plots relevant to the impurities are also presented. [References: 27]
机译:利用紧密结合的线性松饼锡轨道技术研究了铍锌,氮化硼(c-BN)中铍(Be),镁(Mg)和硅(Si)杂质的电子结构。使用以硼(B)或氮(N)晶格位点为中心的64个原子的超级电池进行计算。尽管Be和Mg杂质仅被B子晶格取代,但在Si杂质的情况下,B和N均被考虑了取代。在每种情况下,总能量最小化用于检查杂质位点附近的晶格弛豫,并详细检查杂质与基质晶体的相邻原子之间的化学键合性质。我们发现,取代B的Be和Mg各自创建离域能级,并合并到价带边缘的状态。这些部分占据的水平dan导致p型电导率,如通过实验观察到的那样。与c-BN中分离出的Be和Mg杂质的行为相反,我们发现在B位置取代的Si引起离域杂质态,该态与主机的导带边缘重叠。这些能级可有助于掺杂Si的c-BN的n型导电性。取代阴离子亚晶格的Si在禁带内引起尖锐,部分占据和高度局部化的水平(“深受体水平”)。因此,可以通过每种类型杂质的存在来解释实验观察到的n型和p型c-BN混合物。 Be和Mg杂质附近的主晶格弛豫向外,N位置取代的Si杂质附近的弛豫向外。在用Si代替B的情况下,可以预测向内弛豫。将详细分析杂质和最多六个与杂质最接近的配位壳的总态,轨道态和壳投影态密度。还显示了与杂质有关的电荷密度图。 [参考:27]

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