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FinCANON: A PVT-Aware Integrated Delay and Power Modeling Framework for FinFET-Based Caches and On-Chip Networks

机译:FinCANON:一种基于PVT的集成延迟和功率建模框架,用于基于FinFET的缓存和片上网络

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Recently, FinFETs have emerged as promising substitutes for conventional CMOS because of their superior control of short-channel effects and processing scalability. Nevertheless, lithographic constraints, difficulties in workfunction engineering, supply voltage variations, and temperature nonuniformity across the FinFET integrated circuit may lead to process, supply voltage, and temperature (PVT) variations, which are manifested as large spreads in delay and leakage. In this paper, we present FinCANON, an integrated framework for the simulation of power, delay, as well as PVT variations of FinFET-based caches and on-chip networks. FinCANON consists of CACTI-PVT and ORION-PVT that model caches and on-chip networks, respectively. We have developed a FinFET design library to model the circuit-level characteristics as well as their variation trends with respect to various PVT parameters for FinFET logic gates and memory cells, using accurate device simulation. With a statistical static timing analysis technique and macromodel-based methodology, we have also derived PVT variation models for delay and leakage, considering spatial correlations, to characterize the impact of PVT variations on FinFET-based caches and networks-on-chip (NoCs). In addition, we incorporate voltage generators in the FinFET design library to model back-gate biasing of FinFETs. The cache and NoC models are significantly enhanced to be more modular and scalable. We present results for various FinFET design styles and show that mixing different styles may be a promising strategy for optimizing delay and leakage of caches and NoCs.
机译:最近,由于FinFET具有对短沟道效应的出色控制和处理可扩展性,它们已成为传统CMOS的有希望的替代品。然而,光刻限制,功函数工程中的困难,电源电压变化以及FinFET集成电路上的温度不均匀性可能会导致工艺,电源电压和温度(PVT)变化,这表现为延迟和泄漏的大范围扩展。在本文中,我们介绍了FinCANON,这是一个用于仿真基于FinFET的高速缓存和片上网络的功率,延迟以及PVT变化的集成框架。 FinCANON由分别对高速缓存和片上网络建模的CACTI-PVT和ORION-PVT组成。我们已经开发了FinFET设计库,可以使用精确的器件仿真来针对FinFET逻辑门和存储单元的各种PVT参数,对电路级特性及其变化趋势进行建模。借助统计静态时序分析技术和基于宏模型的方法,我们还考虑了空间相关性,得出了延迟和泄漏的PVT变化模型,以表征PVT变化对基于FinFET的缓存和片上网络(NoC)的影响。此外,我们在FinFET设计库中集成了电压发生器,以对FinFET的背栅偏置建模。缓存和NoC模型得到了显着增强,从而更具模块化和可扩展性。我们介绍了各种FinFET设计风格的结果,并表明混合不同风格可能是优化缓存和NoC的延迟和泄漏的一种有前途的策略。

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