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A Dynamic Leakage and Slew Rate Compensation Circuit for 40-nm CMOS Mixed-Voltage Output Buffer

机译:用于40nm CMOS混合电压输出缓冲器的动态泄漏和斜率补偿电路

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This paper proposes a 40-nm CMOS 2×VDD buffer with slew rate (SR) variation compensated and dynamic leakage reduction during signal transitions. By using the dual variation detectors, five process corners for both nMOS and pMOS could be detected. Thus, the SR deviations will be significantly reduced by controlling the switches of the output stage accordingly. Besides, leakage reduction circuit will shut down current paths to reduce dynamic leakage after signal transitions are completed. This buffer design is implemented using the typical 40-nm CMOS process, where the active area is 0.052 × 0.213 mm. The measured worst case of SR variation improvement is 20.8% and 54.9% when VDDIO is 0.9 and 1.8 V, respectively. The peak dynamic leakage is reduced to 41.0% and 37.5% at 0.9 and 1.8 V, respectively.
机译:本文提出了一种40nm CMOS 2×VDD缓冲器,该缓冲器具有压摆率(SR)变化补偿和信号转换期间的动态泄漏减小功能。通过使用双变化检测器,可以检测到nMOS和pMOS的五个工艺角。因此,通过相应地控制输出级的开关,可以显着降低SR偏差。此外,泄漏减少电路将在信号转换完成后关闭电流路径,以减少动态泄漏。该缓冲器设计使用典型的40 nm CMOS工艺实现,其中有效面积为0.052×0.213 mm。当VDDIO为0.9 V和1.8 V时,测得的SR变化改善的最坏情况分别为20.8%和54.9%。在0.9和1.8 V时,峰值动态泄漏分别降至41.0%和37.5%。

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