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Enormous Resistance Switching Phenomena Observed In Nickel-Aluminum-Oxide Nanocomposite

机译:镍铝氧化物纳米复合材料中观察到的巨大电阻转换现象

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We studied magnetic-transport of anodic aluminum oxide (AAO) films in which Ni was partially electrodeposited in a 50 nm diameter nanohole array. In this two-terminal device structure formed on n-Si substrate, Ta/Au electrodes were formed on the top and the bottom of AAO. We unexpectedly found a phenomenon of enormous bistable resistance switching under the in-plane magnetic field at room temperature. There are two states of high resistance and low resistance. The resistance ratio between the two states is different in each, and ranges from a few hundred % to several tens of thousand %. The switching fields distributed between 1.5 to 2.5 kOe. The reproducibility of the switching phenomenon is not good; once switching is observed, after several cycles of magneto-resistance measurement, it changes into other states with many resistance spikes or small fluctuations. This suggests that a nano-scale conduction path consisting of Ni atoms is formed under the electric field due to atomic migration, and resistance switching takes place when the magnetization of the conduction path is switched by an external field.
机译:我们研究了其中阳极部分电沉积在直径为50 nm的纳米孔阵列中的阳极氧化铝(AAO)膜的磁传输。在形成于n-Si衬底上的这种两端子器件结构中,在AAO的顶部和底部形成Ta / Au电极。我们出乎意料地发现了一种在室温下在平面内磁场下双稳态电阻转换的现象。有高电阻和低电阻两种状态。两种状态之间的电阻比各不相同,范围从几百%到几万%。切换场分布在1.5至2.5 kOe之间。切换现象的再现性不好;一旦观察到开关,经过几个周期的磁阻测量后,它会变为具有许多电阻尖峰或较小波动的其他状态。这表明由于原子迁移,在电场下形成了由Ni原子组成的纳米级传导路径,并且当传导路径的磁化由外部场切换时发生电阻切换。

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