首页> 外文会议>2017 International Meeting for Future of Electron Devices, Kansai >Multilevel resistance switching phenomena observed in the Cu (Ti)/HfO2/Au device
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Multilevel resistance switching phenomena observed in the Cu (Ti)/HfO2/Au device

机译:在Cu(Ti)/ HfO2 / Au器件中观察到多级电阻切换现象

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摘要

Memory devices having multiple resistance states is promising for increase of memory capacity as well as realizing higher functionality. In this study, we studied multiple resistance states appearing in the reset operation mode in the Cu/HfO/Au and Ti/HfO/Au ReRAM devices. Both devices showed bipolar resistance switching property. Ti/HfO/Au device showed multiple resistance states strictly dependent on the amount of reset voltage, on the other hand, resistance of Cu/HfO/Au device did not show clear dependence on the reset voltage.
机译:具有多个电阻状态的存储器件有望增加存储容量并实现更高的功能。在这项研究中,我们研究了在Cu / HfO / Au和Ti / HfO / Au ReRAM器件的复位操作模式下出现的多个电阻状态。两种器件均显示出双极电阻切换特性。 Ti / HfO / Au器件显示出严格取决于复位电压量的多个电阻状态,另一方面,Cu / HfO / Au器件的电阻并未显示出对复位电压的明显依赖性。

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